GAS SENSOR CONTROL DEVICE, GAS SENSOR CONTROL METHOD, AND GAS SENSOR CONTROL SYSTEM

WIPO Patent Application WO/2023/007970

A1

According to the present invention, the concentration of a specific component in a gas to be measured can be calculated, while taking into consideration the deteriorated state of a gas sensor.　A gas sensor control device (100) is for controlling a gas sensor including a first pumping cell (111), and a second pumping cell (113) that outputs a current corresponding to the concentration of a specific component in a gas to be measured. The gas sensor control device (100) has a microprocessor (60) that, when calculating the concentration of the specific component, uses a correction formula based on: an index including at least one of an initial offset indicating the value of a current obtained when the concentration of the specific component is zero at a first reference time, or the difference between the value of a current at the time when the concentration of the specific component at a second reference time is a set concentration, and an ideal value thereof; and a cumulative operation time that is the cumulative total of operation time of the gas sensor since a third reference time.

WO/2022/235556	DYNAMIC MODIFICATION OF CALIBRATION FREQUENCY
JPH0980008	METHOD AND DEVICE FOR REGULATING PH

TANAKA HIROYUKI (JP)
ITO TETSUYA (JP)

PCT/JP2022/023777

February 02, 2023

June 14, 2022

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NGK SPARK PLUG CO (JP)

G01N27/26; G01N27/416

JP2017078579A	2017-04-27
JPH1172478A	1999-03-16
JP2014098658A	2014-05-29
JP2011164086A	2011-08-25
JP2017067717A	2017-04-06

GRANDOM PATENT LAW FIRM (JP)

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