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Patent Searching and Data


Title:
GAS SENSOR, SENSOR PREPARATION METHOD, AND SENSOR ARRAY
Document Type and Number:
WIPO Patent Application WO/2019/214228
Kind Code:
A1
Abstract:
Disclosed in the present invention is a gas sensor, comprising a silicon substrate, a detection electrode, a first barrier film, a heating resistor and a second barrier film which are stacked in sequence, and the gas sensor having a base structure and a cantilever structure curled at a free end, a gas-sensitive material being provided at the end of the cantilever structure. The present invention further provides a sensor array consisting of gas sensors, and provides a gas sensor preparation method, comprising (1) selecting a sacrificial layer; (2) preparing a detection electrode; (3) preparing a first barrier film; (4) preparing a heating resistor; (5) preparing a second barrier film; (6) releasing the films; and (7) loading a gas-sensitive material. The present invention has the advantages of low power consumption, small size, high integration degree, simple production process, and easy positioning, effectively improving the production efficiency.

Inventors:
XU LEI (CN)
PENG SHUFENG (CN)
XIE DONGCHENG (CN)
ZHOU RUIYING (CN)
Application Number:
PCT/CN2018/120547
Publication Date:
November 14, 2019
Filing Date:
December 12, 2018
Export Citation:
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Assignee:
HEFEI MICRO NANO SENSING TECH CO LTD (CN)
International Classes:
G01N27/12; G01N27/04; G01N27/407
Foreign References:
CN108519408A2018-09-11
CN205449859U2016-08-10
CN102359980A2012-02-22
US20020142478A12002-10-03
CN205449863U2016-08-10
Attorney, Agent or Firm:
HEFEI CITY, HAO ZHI YUN PATENTAGENCY (CN)
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