GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE AND GAS SEPARATION DEVICE

WIPO Patent Application WO/2018/020949

A1

Provided are a gas separation membrane, a gas separation membrane module and a gas separation device, each of which has high gas separation selectivity, while being suppressed in decrease of the gas separation selectivity after exposure to an impurity gas. The gas separation membrane, the gas separation membrane module and the gas separation device comprise a first separation layer and a second separation layer; the first separation layer has an Si/C ratio of 0.3 or less, said Si/C ratio being the ratio of the number of silicon atoms to the number of carbon atoms at the second separation layer-side interface of the first separation layer; the second separation layer has a maximum value of the F/C ratio of 0.20 or more, said F/C ratio being the ratio of the number of fluorine atoms to the number of carbon atoms; and the Si/C ratio in the portion where the F/C ratio is maximum is 0.3 or less.

WO/2004/054625	POROUS SINTERED COMPOSITE MATERIALS
JP2004237230	COMPOSITE SEMIPERMEABLE MEMBRANE AND ITS MANUFACTURING METHOD
WO/2016/049281	SEPARATION MODULES, SYSTEMS, AND METHODS

MOCHIZUKI YUSUKE (JP)
MUKAI ATSUSHI (JP)
HARADA MOTOI (JP)
SAWADA MAKOTO (JP)

PCT/JP2017/023880

February 01, 2018

June 29, 2017

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FUJIFILM CORP (JP)

B01D69/12; B01D53/22; B01D69/02; B01D71/10; B01D71/32; B01D71/40; B01D71/64; B01D71/70

WO2016047351A1

2016-03-31

JPH1085571A	1998-04-07
JP2015160167A	2015-09-07
JP2015073980A	2015-04-20
JP2013031852A	2013-02-14
JP2014014808A	2014-01-30
JPH07251046A	1995-10-03
JPH05329343A	1993-12-14
JP2015160201A	2015-09-07

NAKASHIMA Junko et al. (JP)

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