Title:
GAS SEPARATION MEMBRANE WITH PROTECTIVE LAYER, METHOD FOR PRODUCING GAS SEPARATION MEMBRANE WITH PROTECTIVE LAYER, GAS SEPARATION MEMBRANE MODULE AND GAS SEPARATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/098802
Kind Code:
A1
Abstract:
Provided is a gas separation membrane with a protective layer, which has good initial gas permeability, rubbing resistance and bending resistance. This gas separation membrane with a protective layer comprises, in the following order, a gas separation membrane which satisfies a specific condition such as possession of a resin layer that contains a compound having a siloxane bond, a protective layer which is positioned on the resin layer that contains a compound having a siloxane bond in the gas separation membrane, and a porous layer. This method for producing a gas separation membrane with a protective layer produces the above-described gas separation membrane with a protective layer. This gas separation membrane module and this gas separation device comprise the above-described gas separation membrane with a protective layer.
Inventors:
SAWADA MAKOTO (JP)
YONEYAMA SATOSHI (JP)
MOCHIZUKI YUSUKE (JP)
YONEYAMA SATOSHI (JP)
MOCHIZUKI YUSUKE (JP)
Application Number:
PCT/JP2016/080238
Publication Date:
June 15, 2017
Filing Date:
October 12, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B01D71/70; B01D53/22; B01D69/02; B01D69/12; B32B9/00
Foreign References:
| JP2015160201A | 2015-09-07 | |||
| JP2013166131A | 2013-08-29 | |||
| JP2015134310A | 2015-07-27 | |||
| JP2015163386A | 2015-09-10 | |||
| JPH06126138A | 1994-05-10 | |||
| JPH05137983A | 1993-06-01 | |||
| JPH11169689A | 1999-06-29 |
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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