GAS SPLIT-FLOW SUPPLY DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE

WIPO Patent Application WO/2013/114486

A1

Provided is a gas split-flow supply device for a semiconductor production device, provided with: a main gas supply line (8) communicating with the downstream side of a control valve (3); an orifice (6) disposed on the main gas supply line (8) at the downstream side from the control valve (3); a plurality of branched ducts (9a, 9n) connected in a parallel arrangement at the downstream side of the main gas supply line (8); branched duct on-off valves (10a, 10n) interposed in the branched ducts (9a, 9n); a pressure sensor (5); split-flow gas outlets (11a, 11n) disposed at the outlet end of the branched ducts (9a, 9n); and an arithmetic controller (7) for outputting to a valve drive part (3a) a control signal (Pd) for opening and closing the control valve (3) in the direction of decreasing the difference between a calculated flow rate value and a set flow rate value, and for outputting open/close control signals (Od1, Odn) to the branched duct on-off valves (10a, 10n) so that the branched duct on-off valves (10a, 10n) are opened in succession for a given time and are then closed, the flow rate of a process gas flowed through an orifice (6) being controlled by a pressure-type flow rate controller (1a), and the process gas being supplied as a split flow by opening and closing the branched duct on-off valves (10a, 10n).

NISHINO KOUJI (JP)
DOHI RYOUSUKE (JP)
IKEDA NOBUKAZU (JP)
HIRATA KAORU (JP)
MORISAKI KAZUYUKI (JP)

PCT/JP2012/006626

August 08, 2013

October 17, 2012

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FUJIKIN KK (JP)

G05D7/06; G05D11/03

JP2004280788A	2004-10-07
JP2005115501A	2005-04-28
JPH0728529A	1995-01-31

SUGIMOTO, Takeo et al. (JP)
Sugimoto Strong (JP)

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