Title:
GAS SUPPLY DEVICE FOR SUBSTRATE PROCESSING DEVICE, AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/002590
Kind Code:
A1
Abstract:
The present invention relates to a gas supply device for a substrate processing device, and a substrate processing device, wherein the gas supply device comprises: a first gas supply part for supplying a first gas to a chamber which provides a process space for a substrate; a second gas supply part for supplying, to the chamber, a second gas having a vapor pressure that is greater than the first gas; a first carrier supply part for supplying a first carrier gas to the first gas supply part such that the flow force of the first gas increases; and a second carrier supply part for supplying a second carrier gas to the second gas supply part such that the flow force of the second gas increases.
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Inventors:
LEE JAE WAN (KR)
KIM YONG HYUN (KR)
KIM YOON JEONG (KR)
KIM YUN HOE (KR)
PARK CHANG KYUN (KR)
KIM YONG HYUN (KR)
KIM YOON JEONG (KR)
KIM YUN HOE (KR)
PARK CHANG KYUN (KR)
Application Number:
PCT/KR2020/006743
Publication Date:
January 07, 2021
Filing Date:
May 25, 2020
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/67; C23C16/44
Foreign References:
| JPH108252A | 1998-01-13 | |||
| US20040060518A1 | 2004-04-01 | |||
| JP2007227429A | 2007-09-06 | |||
| KR20190024737A | 2019-03-08 | |||
| KR20170077013A | 2017-07-05 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
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