Title:
GAS SUPPLY DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/101077
Kind Code:
A1
Abstract:
A compact structured gas supply device capable of preventing re-liquefaction of vaporized gas with a requisite minimum heating means, and widely reducing an installation area. The gas supply device (100) is provided with a tank (1) to retain a material liquid (M), and a mass flow controller (2) connected to an inside of the tank (1) through a first valve unit (31) for controlling a flow rate of gas vaporized from the material liquid (M), wherein an inner flow channel (13) is formed within an outer wall of the tank (1), and the inner flow channel is provided with a generated gas discharge line (Gout) which comprises a first valve inflow channel (131) connecting the inside of the tank (1) and a first inlet port (31i), and a first valve outflow channel (132) connecting a first outlet port (13o) and an introduction port (H) of the mass flow controller (2).
Inventors:
HAYASHI, Tatsuya (Co. Ltd., 11-5, Hokodate-cho, Kamitoba, Minami-ku, Kyoto-sh, Kyoto 16, 〒6018116, JP)
Application Number:
JP2010/053038
Publication Date:
September 10, 2010
Filing Date:
February 26, 2010
Export Citation:
Assignee:
HORIBA STEC, Co.,Ltd. (11-5, Hokodate-cho Kamitoba, Minami-ku, Kyoto-sh, Kyoto 16, 〒6018116, JP)
株式会社堀場エステック (〒16 京都府京都市南区上鳥羽鉾立町１１番５ Kyoto, 〒6018116, JP)
株式会社堀場エステック (〒16 京都府京都市南区上鳥羽鉾立町１１番５ Kyoto, 〒6018116, JP)
International Classes:
G05D7/06; B01J4/02; F17C9/02; F17C13/00
Attorney, Agent or Firm:
NISHIMURA, Ryuhei (3F Karasumanijyo Bldg, 267 Makieya-cho, Nijyo-agaru, Karasuma-dori, Nakagyo-ku, Kyoto-cit, Kyoto 57, 〒6040857, JP)
Download PDF: