Title:
GAS TREATMENT METHOD AND GAS TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/262478
Kind Code:
A1
Abstract:
Provided are a gas treatment method and a gas treatment device by which a VOC-containing gas can be efficiently treated using ultraviolet radiation having a main emission wavelength of 180 nm or less. The present invention provides a gas treatment method which involves causing a gas comprising a mixture of a substance belonging to the VOC family in air to flow into a treatment space to treat the gas, wherein a light source for emitting ultraviolet radiation having a main emission wavelength of 160 nm to 180 nm is disposed inside the treatment space, and the gas is caused to flow at a flow velocity of 23 m/s or less and with a distance of 10 mm or less from the light-emitting region of the light source.
Inventors:
NAITO KEISUKE (JP)
Application Number:
PCT/JP2020/024867
Publication Date:
December 30, 2020
Filing Date:
June 24, 2020
Export Citation:
Assignee:
USHIO ELECTRIC INC (JP)
International Classes:
H01J65/00; A61L9/20; F24F7/00; H01J61/16
Domestic Patent References:
| WO2019101276A1 | 2019-05-31 |
Foreign References:
| JPH0361982U | 1991-06-18 | |||
| JP2014500890A | 2014-01-16 | |||
| JPH09509340A | 1997-09-22 | |||
| JP2003290622A | 2003-10-14 | |||
| JP2004163055A | 2004-06-10 | |||
| JP2000102596A | 2000-04-11 | |||
| JP2007335350A | 2007-12-27 |
Other References:
See also references of EP 3968358A4
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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