GAS TREATMENT METHOD AND GAS TREATMENT DEVICE

Title:

GAS TREATMENT METHOD AND GAS TREATMENT DEVICE

Document Type and Number:

WIPO Patent Application WO/2021/256450

Kind Code:

A1

Abstract:

The present invention provides a technology that enables, with a simple method, degradation of a to-be-treated gas containing a treatment target substance at a low concentration in the order of several hundred ppm or less.　The gas treatment method of the present invention comprises; a step (a) for passing, in a housing, a to-be-treated gas containing a target substance that is mixed with air, that is volatile at normal temperature, and that belongs to at least one type in a group consisting of carbon compounds, nitrogen compounds, and sulfur compounds; a step (b) for introducing ozone, at 200°C or less, into a space inside the housing where the to-be-treated gas is passed; and a step (c) for agitating the to-be-treated gas after execution of the step (b); and a step (d) for heating the to-be-treated gas to 300°C or more after execution of the step (c).

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Inventors:

OTSUKA YUICHI (JP)
HIRAOKA TAKAHIRO (JP)
MIURA MASAKI (JP)
NAKAMURA KENSUKE (JP)

Application Number:

PCT/JP2021/022608

Publication Date:

December 23, 2021

Filing Date:

June 15, 2021

Export Citation:

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Assignee:

USHIO ELECTRIC INC (JP)

International Classes:

B01D53/48; B01D53/52; B01D53/54; B01D53/58; B01D53/72; B01D53/76; C01B13/10

Foreign References:

JP2007044605A	2007-02-22
JPS49127261A	1974-12-05
JP2019155242A	2019-09-19

Other References: