GAS TYPE PRECISE SILICON WAFER CLEANING AND DRYING APPARATUS

Title:

GAS TYPE PRECISE SILICON WAFER CLEANING AND DRYING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2006/087990

Kind Code:

A1

Abstract:

A gas type precise cleaning and drying apparatus comprising a reaction tank (52) having enclosed structure of a clean space which can be opened as required and a temperature control function, a plurality of mixed cleaning gas production units (49, 50, 51) connected with the reaction tank, an ultrapure steam production unit (74), an N2 purge pipe (65), an IPA vapor production unit (66), an exhaust pipe (72), a waste liquid pipe (73), supply piping, a valve, an operating panel, and an operation controller (94). Cleaning is repeatedly performed a predetermined number of times with a mixed cleaning gas mixed in combination of predetermined mode such that contaminants existing on the inner surface of an opening having a width of 0.1 μm or less such as a polysilicon film formed on a silicon wafer are chemically decomposed and evaporated by forming a cleaning gas adsorption layer of several monolayers and no residue is left on the inner surface of the opening in the reaction tank by controlling supply and exhaust of cleaning gas to permit the same quantity of supplied cleaning gas to be adsorbed. Subsequently, the adsorption layer is substituted by IPA or ultrapure water and left, as it is, for a predetermined time at a predetermined temperature. The substituted adsorption layer is then purged completely thus completing drying.

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Inventors:

IWAMATSU SEIICHI (JP)
MURAKAMI YUKIHIRO (JP)
YAMAZAKI KENJI (JP)
OKAMOTO RYUJI (JP)

Application Number:

PCT/JP2006/302462

Publication Date:

August 24, 2006

Filing Date:

February 13, 2006

Export Citation:

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Assignee:

INTELLECTUAL PROPERTY BANK (JP)
ICF INC (JP)
IWAMATSU SEIICHI (JP)
MURAKAMI YUKIHIRO (JP)
YAMAZAKI KENJI (JP)
OKAMOTO RYUJI (JP)

International Classes:

H01L21/304

Foreign References:

JP2004055753A	2004-02-19
JP2003174001A	2003-06-20
JPH07283192A	1995-10-27
JPH03129731A	1991-06-03
JP2004153289A	2004-05-27
JP2003347268A	2003-12-05

Attorney, Agent or Firm:

Ito, Mitsuru (Yotsuya Chuou Building 2-17, Yotsuya 3-chome, Shinjyuk, Tokyo 04, JP)
Intellectual Property Bank Corp. (1-21-19 Toranomo, Minato-ku Tokyo 01, JP)

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