Title:
GATE VALVE FOR SEMICONDUCTOR APPARATUS, AND MAINTENANCE METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/116158
Kind Code:
A1
Abstract:
A gate valve (200) for a semiconductor apparatus, and a maintenance method therefor. The gate valve (200) comprises: a valve box (201), which has a passage (206) for being connected to a vacuum pipeline in a semiconductor apparatus; an actuation mechanism (202), which has a connecting flange (205) for being connected to the valve box (201); and a fixing device, which is arranged on the connecting flange (205) and is configured to detachably connect the actuation mechanism (202) to the valve box (201), wherein the removal direction of the fixing device is in the direction of the actuation mechanism (202).
Inventors:
SONG YU (CN)
TAN TAIDE (CN)
JIANG WEI (CN)
TAN TAIDE (CN)
JIANG WEI (CN)
Application Number:
PCT/CN2022/126480
Publication Date:
June 29, 2023
Filing Date:
October 20, 2022
Export Citation:
Assignee:
PIOTECH INC (CN)
International Classes:
F16K3/02; F16B5/02; F16B5/06; F16K27/04; F16K27/08
Foreign References:
| CN216200695U | 2022-04-05 | |||
| CN212564407U | 2021-02-19 | |||
| CN108730542A | 2018-11-02 | |||
| CN208587528U | 2019-03-08 | |||
| CN209875966U | 2019-12-31 | |||
| CN207278922U | 2018-04-27 | |||
| CN207814597U | 2018-09-04 |
Attorney, Agent or Firm:
LEE AND LI - LEAVEN IPR AGENCY LTD. (CN)
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