Title:
GATE VALVE FOR SEMICONDUCTOR PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2000/075542
Kind Code:
A1
Abstract:
A gate valve (20) for semiconductor processing system includes a base frame (28) movable along a guide (26) toward and away from a valve seat (22) surrounding an opening (14). Disposed on the upper end of the guide (26) is a first stopper (56) that defines the limit of travel of the base frame (28) on the side of the valve seat (22). The base frame (28) has a swing frame (34) swingably attached thereto, with a valve seat (24) attached to the upper end thereof. The base frame (28) and swing frame (34) are interconnected by a link mechanism (36) capable of bending and stretching by being bent in the intermediate portion thereof, and by spring/damper member (46). The reciprocating rod (54) of an air actuator (52) is connected to an intermediary member (38) in the intermediate portion of the link mechanism (36).
Inventors:
OKA HIROKI (JP)
Application Number:
PCT/JP2000/003466
Publication Date:
December 14, 2000
Filing Date:
May 30, 2000
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
OKA HIROKI (JP)
OKA HIROKI (JP)
International Classes:
F16K3/18; F16K51/02; (IPC1-7): F16K3/18; F16K51/02
Foreign References:
| JPH10227365A | 1998-08-25 | |||
| JPH09310766A | 1997-12-02 | |||
| JPH0117024B2 | 1989-03-28 | |||
| JPH05196450A | 1993-08-06 | |||
| JPH10159999A | 1998-06-16 |
Other References:
See also references of EP 1182387A4
Attorney, Agent or Firm:
Suzuye, Takehiko (Kasumigaseki 3-chome Chiyoda-ku Tokyo, JP)
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