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Patent Searching and Data


Title:
GATE VALVE AND SUBSTRATE PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2014/034247
Kind Code:
A1
Abstract:
A gate valve (70) is provided with a housing (71) having a vertical wall in which a plurality of openings (71a) are formed so as to correspond to substrates that are to be conveyed and are arranged in multiple stages, valve bodies (81) provided in the housing (71) and used for opening/closing the openings (71a), a valve-lifting/lowering mechanism (73) for lifting or lowering the valve bodies (81), a valve-rotating mechanism (75) for rotating the valve bodies (81) in concert with the lifting or lowering of the valve-lifting mechanism (73), and a valve-pressing mechanism (74) for pressing the seal surface of the valve bodies (81) to the openings. The valve-lifting/lowering mechanism (73) lifts or lowers the valve bodies (81) between a position corresponding to an opening and a retracted position, the valve-rotating mechanism rotates the valve bodies (81) when the valve bodies (81) have been lifted or lowered by the valve-lifting/lowering mechanism (73), and the valve-pressing mechanism (74) presses the valve bodies (81) in position corresponding to the openings.

Inventors:
TATESHITA KOICHI (JP)
Application Number:
PCT/JP2013/067827
Publication Date:
March 06, 2014
Filing Date:
June 28, 2013
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
F16K3/18; B65G49/00; F16K3/06; F16K31/524; F16K51/02; H01L21/677
Foreign References:
JP2000337546A2000-12-05
JP2004036760A2004-02-05
JP2013011289A2013-01-17
JP2001082613A2001-03-30
Attorney, Agent or Firm:
TAKAYAMA HIROSHI (JP)
Hiroshi Takayama (JP)
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