GENTLE SELF-HYDROLYTIC MONODISPERSE THIN FILM FORMING MATERIAL, MONODISPERSE PIGMENT COVERED WITH THEM AND COSMETICS BLENDED WITH THEM

WIPO Patent Application WO/2002/083802

A1

A self-hydrolytic monodisperse thin film forming material consisting of only a semiconductor-quality ultrapure water and high-purity tetraethoxysilane, and mixed into a colloidal form free from phase separation for at least 15 min by a ultrasonic homogenizer with a longitudinal oscillation amplitude of 20 $g(m)m, a monodisperse pigment formed by coating with the thin film forming material, and cosmetics containing the monodisperse pigment. A gentle self-hydrolytic treatment without blending a catalyst with an organic solvent can fully fill and cover a discontinuous fine structure of pigment particles to prevent eluting of various ions, and improve various physical properties such as dispersibility.

TAKEDA ATSUSHI (JP)
MIYAHARA MIKIO (JP)
SAKATANI HIDETOSHI (JP)
SATO HIROSHI (JP)
SATO HIDEJI (JP)

PCT/JP2002/003401

October 24, 2002

April 04, 2002

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ISI CORP (JP)
TAKEDA ATSUSHI (JP)
MIYAHARA MIKIO (JP)
SAKATANI HIDETOSHI (JP)
SATO HIROSHI (JP)
SATO HIDEJI (JP)

A61K8/19; A61K8/00; A61K8/02; A61K8/58; A61Q1/00; A61Q1/02; A61Q1/04; A61Q1/06; A61Q1/08; A61Q1/10; A61Q1/12; A61Q17/04; C09B67/08; C09C3/12; C09D183/02; (IPC1-7): C09D183/02; A61K7/00; A61K7/02; A61K7/027; A61K7/031; A61K7/032; A61K7/42; A61K7/48; C09B67/08; C09C3/06; C09C3/12

JP2000327996A	2000-11-28
JPH08157771A	1996-06-18
JP2000281330A	2000-10-10
JPH072639A	1995-01-06
JPS63120766A	1988-05-25

Tokita, Susumu (Higashi-shimbashi 1-chome Minato-ku, Tokyo, JP)

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