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Patent Searching and Data


Title:
GLASS SUBSTRATE PROVIDED WITH TRANSPARENT ELECTRODE AND METHOD FOR MANUFACTURING SUCH GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2007/135874
Kind Code:
A1
Abstract:
Provided is a method for manufacturing a glass substrate having a transparent electrode. In the method, in the case of manufacturing the glass substrate by laser patterning method, scratches are not generated on the surface of the glass substrate, the resistance value of the formed transparent electrode is not increased and surface roughness is not increased. The method is provided with a pattern forming step wherein after forming a transparent conductive film on the glass substrate, a glass substrate having a thin film pattern is provided by laser patterning. The method is also provided with an etching step wherein etching is performed to the glass substrate having the thin film pattern by using an etching solution, which melts the glass substrate and has a characteristic of melting the substrate at a higher speed than the speed of melting the transparent conductive film.

Inventors:
KISHI, Masahiro (Limited 12-1, Yurakucho1-chome, Chiyoda-k, Tokyo 05, 1008405, JP)
Application Number:
JP2007/059781
Publication Date:
November 29, 2007
Filing Date:
May 11, 2007
Export Citation:
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Assignee:
ASAHI GLASS COMPANY, LIMITED (12-1, Yurakucho 1-chome Chiyoda-k, Tokyo 05, 1008405, JP)
旭硝子株式会社 (〒05 東京都千代田区有楽町一丁目12番1号 Tokyo, 1008405, JP)
International Classes:
H01B13/00; C03C15/00; H01J9/02; H01J17/49; H01S3/00
Attorney, Agent or Firm:
SENMYO, Kenji et al. (4th Floor, SIA Kanda Square17, Kanda-konyach, Chiyoda-ky Tokyo 35, 1010035, JP)
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