GRAPHENE-CLEANING PROCESS AND DEVICE COMPRISING GRAPHENE TREATED THEREBY

WIPO Patent Application WO/2014/189191

A1

The present invention relates to a graphene-cleaning process using electrostatic force, and a graphene device treated thereby. More particularly, the present invention provides a graphene-cleaning process comprising the steps of: removing, using an organic solvent, a graphene support layer having a graphene layer formed on one side thereof; and removing a graphene support layer residue, by positioning a cleaning member, at a distance allowing for interaction, on the graphene layer from which the graphene support layer has been removed and then moving the cleaning member on the graphene layer, and a device comprising graphene cleaned by the process. According to the present invention, it is possible to uniformly improve the performance of graphene on a large scale without additional processes or costs. Furthermore, the cleaned graphene device which is manufactured in the present invention has excellent electrical properties, as well as excellent mechanical and optical properties.

CHOI WON JIN (KR)
LEE JEONG O (KR)
LEE YOUNG KUK (KR)
CHUNG YOON JANG (KR)
PARK SE RIN (KR)

PCT/KR2013/011732

November 27, 2014

December 17, 2013

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KOREA RES INST CHEM TECH (KR)

B08B3/08; B08B1/00

KR20130026679A	2013-03-14
KR20130020424A	2013-02-27
KR20110084110A	2011-07-21

GOOSSENS ET AL.: "Mechanical cleaning of graphene", APPLIED PHYSICS LETTERS, vol. 100, 16 February 2012 (2012-02-16), pages 073110-1 - 073110-3
HER ET AL.: "Graphene transfer with reduced residue", PHYSICS LETTERS A, vol. 377, 10 April 2013 (2013-04-10), pages 1455 - 1458

LEE, Won-Hee (Sung-ji Heights II642-16 Yoksam-dong,Kangnam-gu, Seoul 135-080, KR)

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