Title:
GRAPHITE CARRYING PLATE FOR LED EPITAXIAL WAFER PROCESS
Document Type and Number:
WIPO Patent Application WO/2014/086250
Kind Code:
A1
Abstract:
Provided is a graphite carrying plate for an LED epitaxial wafer process. The graphite carrying plate comprises multiple wafer grooves (1) provided on the carrying plate, the wafer grooves being used for accommodating an epitaxial wafer substrate (16), and the inner edge of the wafer groove (1) being a concave step (13) and has multiple support portions (14) extending inwardly; the graphite carrying plate further comprises an edge (2) of the graphite carrying plate and an axle hole (3) provided at the center of the graphite carrying plate. According to requirements of different process parameters, grooves of different quantity and different size can be provided. The structure can reduce the interference in the air flow in the reaction chamber and improve the edge yield of the wafer.
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Inventors:
HSIEH HSIANG-PIN (CN)
NAN QI (CN)
PAN LEI (CN)
NAN QI (CN)
PAN LEI (CN)
Application Number:
PCT/CN2013/088264
Publication Date:
June 12, 2014
Filing Date:
December 02, 2013
Export Citation:
Assignee:
XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L21/673; C23C16/458; H01L21/683
Foreign References:
| CN102983093A | 2013-03-20 | |||
| CN201942749U | 2011-08-24 |
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