Title:
GROOVE STRUCTURE FOR PRINT FILM FORMING AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2017/206206
Kind Code:
A1
Abstract:
Disclosed are a groove structure for print film forming and a manufacturing method therefor. The groove structure is located on a substrate (1) and comprises a dam (2) and a groove (3) enclosed by the dam (2). The dam (2) comprises at least two stacked branch dam layers (21), the materials of the branch dam layers (21) are silicon nitride or silicon oxide, the materials of two adjacent branch dam layers (21) are different, and the material of the uppermost branch dam layer (21) is silicon oxide. The inclined inner circumferential surface of the groove (3) enclosed by the branch dam layers (21) made of silicon oxide and an upper surface of the uppermost branch dam layer (21) are hydrophobic surfaces, and the inclined inner circumferential surface of the groove (3) enclosed by the branch dam layers (21) made of silicon nitride is a hydrophilic surface, so that a non-uniformity in film thickness caused after solvent evaporation can be avoided.
Inventors:
ZHOU XINGYU (CN)
ZENG WEIJING (CN)
ZENG WEIJING (CN)
Application Number:
PCT/CN2016/086545
Publication Date:
December 07, 2017
Filing Date:
June 21, 2016
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
H01L51/00; H01L27/32; H01L51/56
Foreign References:
| CN103187434A | 2013-07-03 | |||
| CN105470408A | 2016-04-06 | |||
| CN103241025A | 2013-08-14 | |||
| CN1633477A | 2005-06-29 | |||
| US20060046062A1 | 2006-03-02 |
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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