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Patent Searching and Data


Title:
GROUP 5 METAL COMPOUND, PREPARATION METHOD THEREFOR, FILM DEPOSITION PRECURSOR COMPOSITION COMPRISING SAME, AND FILM DEPOSITION METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2018/048124
Kind Code:
A1
Abstract:
The present invention relates to: a novel group 5 metal compound; a preparation method for the group 5 metal compound; a group 5 metal-containing film deposition precursor composition comprising the group 5 metal compound; and a group 5 metal-containing film deposition method using the group 5 metal-containing film deposition precursor composition.

Inventors:
HAN WON SEOK (KR)
PARK MYEONG-HO (KR)
KIM DAE-YOUNG (KR)
CHOI JUN HWAN (KR)
Application Number:
PCT/KR2017/009188
Publication Date:
March 15, 2018
Filing Date:
August 23, 2017
Export Citation:
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Assignee:
UP CHEMICAL CO LTD (KR)
International Classes:
C07F9/00; C23C16/18; C23C16/34; C23C16/40; C23C16/455; H01L21/02; H01L21/28; H01L21/285
Foreign References:
KR20100060481A2010-06-07
KR20110041498A2011-04-21
KR20120102641A2012-09-18
KR20130078965A2013-07-10
Other References:
HERRMANN, W. A. ET AL.: "First Amido-functionalized Niobium and Tantalum Complexes of the Ansa-structural Type: Synthesis and Photochemical Si-N Bond Cleavage", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 506, 1996, pages 357 - 361, XP004092813
Attorney, Agent or Firm:
MAPS INTELLECTUAL PROPERTY LAW FIRM (KR)
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