Title:
GROUP IV METAL ELEMENT-CONTAINING COMPOUND, PREPARATION METHOD THEREFOR, PRECURSOR COMPOSITION COMPRISING SAME COMPOUND FOR FILM FORMATION, AND FILM FORMING METHOD USING SAME COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/156451
Kind Code:
A1
Abstract:
Provided are a novel Group IV metal element-containing compound, a preparation method for the Group IV metal element-containing compound, a precursor composition comprising the Group IV metal element-containing compound for film formation, and a method for formation of a Group IV metal element-containing film by using the Group IV metal element-containing compound. An atomic layer deposition method using a novel Group IV metal element-containing compound according to embodiments of the present application has the advantage of being able to form a Group IV metal element-containing film at a higher temperature than conventionally known Group IV metal element-containing compounds.
Inventors:
HAN WON SEOK (KR)
KOH WONYONG (KR)
PARK MYEONG-HO (KR)
KOH WONYONG (KR)
PARK MYEONG-HO (KR)
Application Number:
PCT/KR2019/001447
Publication Date:
August 15, 2019
Filing Date:
February 01, 2019
Export Citation:
Assignee:
UP CHEMICAL CO LTD (KR)
International Classes:
C07F7/00; C23C16/40; C23C16/455
Foreign References:
| KR20100072021A | 2010-06-29 | |||
| KR20100083145A | 2010-07-21 | |||
| KR20140074162A | 2014-06-17 | |||
| KR101502251B1 | 2015-03-12 | |||
| KR20160096480A | 2016-08-16 |
Attorney, Agent or Firm:
MAPS INTELLECTUAL PROPERTY LAW FIRM (KR)
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