Title:
GUIDING DEVICE AND ASSOCIATED SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/127565
Kind Code:
A3
Abstract:
A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.
Inventors:
LABETSKI DZMITRY (NL)
BERENDSEN CHRISTIANUS (NL)
DUARTE RODRIGES NUNES RUI (NL)
ERSHOV ALEXANDER (US)
FEENSTRA KORNELIS (NL)
FOMENKOV IGOR (US)
HUMMLER KLAUS (US)
JOHNKADAKSHAM ARUN (US)
KRAUSHAAR MATTHIAS (NL)
LAFORGE ANDREW (US)
LANGLOIS MARC (US)
LOGINOV MAKSIM (NL)
MA YUE (US)
MOJAB SEYEDMOHAMMAD (US)
NADIR KERIM (NL)
SHATALOV ALEXANDER (NL)
STEWART JOHN (US)
TEGENBOSCH HENRICUS (NL)
XIA CHUNGUANG (US)
BERENDSEN CHRISTIANUS (NL)
DUARTE RODRIGES NUNES RUI (NL)
ERSHOV ALEXANDER (US)
FEENSTRA KORNELIS (NL)
FOMENKOV IGOR (US)
HUMMLER KLAUS (US)
JOHNKADAKSHAM ARUN (US)
KRAUSHAAR MATTHIAS (NL)
LAFORGE ANDREW (US)
LANGLOIS MARC (US)
LOGINOV MAKSIM (NL)
MA YUE (US)
MOJAB SEYEDMOHAMMAD (US)
NADIR KERIM (NL)
SHATALOV ALEXANDER (NL)
STEWART JOHN (US)
TEGENBOSCH HENRICUS (NL)
XIA CHUNGUANG (US)
Application Number:
PCT/EP2018/050278
Publication Date:
September 27, 2018
Filing Date:
January 05, 2018
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
H05G2/00; G03F7/20
Domestic Patent References:
| WO2011110383A1 | 2011-09-15 |
Foreign References:
| US20090073396A1 | 2009-03-19 | |||
| US20090154642A1 | 2009-06-18 | |||
| US20150008335A1 | 2015-01-08 | |||
| US20140306115A1 | 2014-10-16 | |||
| US20110164236A1 | 2011-07-07 |
Attorney, Agent or Firm:
FILIP, Diana (NL)
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