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Title:
HARD COATING AND MEMBER COATED WITH HARD COATING
Document Type and Number:
WIPO Patent Application WO/2018/078731
Kind Code:
A1
Abstract:
Provided is a hard coating 24, which is coated on the surface of a tool substrate, and in which an A layer 34, a B layer 36, and a nanoscale alternating layer 40 are alternately laminated to a film thickness of 0.5-20 μm by physical vapor deposition, wherein the nanoscale alternating layer 40 is obtained by alternately laminating a C layer 39 and a nanoscale A layer 37 or nanoscale B layer 38 to nano-order thicknesses, the nanoscale A layer 37 or nanoscale B layer 38 having the same composition as the A layer 34 or B layer 36. The A layer 34 has a compositional formula of (AlaTibCrcαd)N and a thickness of 0.5-1000 nm, the B layer 36 has a compositional formula of (AleTifCrgβh)CXN1-X, and a thickness of 0.5-1000 nm, the nanoscale alternating layer 40 has a thickness of 1-1000 nm, the C layer 39 has a compositional formula of [AliCrj(SiC)kγl]CYN1-Y, and the C layer 39 and the nanoscale A layer 37 or nanoscale B layer have a thickness of 0.5-500 nm.

Inventors:
SAKURAI MASATOSHI (JP)
WANG MEI (JP)
Application Number:
PCT/JP2016/081647
Publication Date:
May 03, 2018
Filing Date:
October 25, 2016
Export Citation:
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Assignee:
OSG CORP (JP)
International Classes:
C23C14/06
Domestic Patent References:
WO2015064241A12015-05-07
WO2015147241A12015-10-01
WO2015156383A12015-10-15
WO2016013645A12016-01-28
WO2013000557A12013-01-03
WO2008146727A12008-12-04
Foreign References:
JP2013516331A2013-05-13
JP2016098434A2016-05-30
JP2012035377A2012-02-23
JP2011189473A2011-09-29
JP2012097304A2012-05-24
JP2010001547A2010-01-07
JPH08134629A1996-05-28
Other References:
O. DURAND-DROUHIN; A. E. SANTANA; A. KARIMI; V. H. DERFLINGER; A. SCHUTZE: "Surface and Coatings Technology (Switzerland", vol. 163-164, 2003, ELSEVIER SCIENCE, article "Mechanical Properties and failure modes of TiAl(Si)N single and multilayer thin films", pages: 260 - 266
See also references of EP 3533899A4
Attorney, Agent or Firm:
IKEDA Haruyuki et al. (JP)
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