Title:
HARDMASK COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/135506
Kind Code:
A1
Abstract:
The present invention provides a hardmask composition comprising: a polymer of a compound having a specific structure; and a solvent. From the hardmask composition, a hardmask of which etching resistance, solubility, and flatness are simultaneously improved can be formed.
Inventors:
CHOI HAN YOUNG (KR)
YANG DON SIK (KR)
LEE EUN SANG (KR)
YANG DON SIK (KR)
LEE EUN SANG (KR)
Application Number:
PCT/KR2018/015808
Publication Date:
July 11, 2019
Filing Date:
December 13, 2018
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
International Classes:
G03F7/11; C08G61/02
Foreign References:
| KR20160099997A | 2016-08-23 | |||
| KR20100080148A | 2010-07-08 | |||
| KR20160126353A | 2016-11-02 | |||
| KR20130078745A | 2013-07-10 | |||
| KR20140083695A | 2014-07-04 |
Attorney, Agent or Firm:
DOOHO IP LAW FIRM (KR)
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