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Patent Searching and Data


Title:
HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2018/074430
Kind Code:
A1
Abstract:
A heat-developable photosensitive material has on one surface of a support body an image formation layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and has on the other surface of the support body a non-photosensitive backing layer. The image formation layer or the image formation layer and the non-photosensitive backing layer contains an infrared absorbing dye that absorbs at least infrared light having a wavelength of 700 nm or greater. Also provided is a method for manufacturing the heat-developable photosensitive material.

Inventors:
Hashi, Yoshihisa (798 Miyanodai, Kaisei-machi, Ashigarakami-gu, Kanagawa 23, 〒2580023, JP)
SHIMOYAMA, Munenori (798 Miyanodai, Kaisei-machi, Ashigarakami-gu, Kanagawa 23, 〒2580023, JP)
JIMBO, Yoshihiro (798 Miyanodai, Kaisei-machi, Ashigarakami-gu, Kanagawa 23, 〒2580023, JP)
Application Number:
JP2017/037414
Publication Date:
April 26, 2018
Filing Date:
October 16, 2017
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
G03C1/498; G03C1/74; G03C5/08
Foreign References:
JPH09510022A1997-10-07
JPH09304873A1997-11-28
JP2003005327A2003-01-08
JPS63174045A1988-07-18
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (3-17, Shinjuku 4-chome Shinjuku-k, Tokyo 22, 〒1600022, JP)
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