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Title:
HEAT-SENSITIVE RECORDING MATERIAL AND DIPHENYLSULFONE
Document Type and Number:
WIPO Patent Application WO/2017/086302
Kind Code:
A1
Abstract:
According to the present invention, the contained amount of a compound measured by mass spectrometry to have a molecular weight of 650-670, typically a molecular weight of 660, is reduced to 0.5 mass% or less in a heat-sensitive recording material containing 3,3'-diallyl-4,4'-dihydroxy diphenylsulfone, or in a diphenylsulfone or a color developer. Accordingly, a heat-sensitive recording material, a color developer, or a diphenylsulfone is provided which is less susceptible to background fogging under moisture and heat and which has excellent color-developed image preservation stability.

Inventors:
EGUSA Tsunetoshi (126, Minooki, Fukuyama-sh, Hiroshima 67, 〒7218567, JP)
FUJII Takashi (126, Minooki, Fukuyama-sh, Hiroshima 67, 〒7218567, JP)
TSUKUI Hiroyuki (126, Minooki, Fukuyama-sh, Hiroshima 67, 〒7218567, JP)
KURATA Takaaki (31-12 Shimo 3-chome, Kita-k, Tokyo 88, 〒1158588, JP)
Application Number:
JP2016/083791
Publication Date:
May 26, 2017
Filing Date:
November 15, 2016
Export Citation:
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Assignee:
NIPPON KAYAKU KABUSHIKI KAISHA (1-1 Marunouchi 2-chome, Chiyoda-ku Tokyo, 05, 〒1000005, JP)
International Classes:
B41M5/333; C07C317/22
Domestic Patent References:
WO2004089883A12004-10-21
Foreign References:
JPH11208121A1999-08-03
JP2015124208A2015-07-06
JPH1129549A1999-02-02
JPS6189090A1986-05-07
JPS6253957A1987-03-09
JPH01150576A1989-06-13
JPH01178491A1989-07-14
JP3992252B22007-10-17
Attorney, Agent or Firm:
ASAMURA PATENT OFFICE, P.C. (Tennoz Central Tower, 2-2-24 Higashi-Shinagawa Shinagawa-k, Tokyo 76, 〒1408776, JP)
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