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Patent Searching and Data


Title:
HEAT-SOURCE CONCENTRATING DEVICE AND A WASTE-TREATMENT DEVICE AND METHOD USING MULTI-PLASMA
Document Type and Number:
WIPO Patent Application WO/2010/134760
Kind Code:
A2
Abstract:
The present invention relates to a heat-source concentrating device using multi-plasma and to a waste-treatment device and method using the same. The heat-source concentrating device according to the present invention comprises: a processing chamber; and a plurality of plasma units which are connected to the processing chamber and cause a plurality of plasma torches to flow into the processing chamber, and the heat-source concentrating device according to the present invention can effectively overcome the problems of processing treatment devices such as plasma scrubbing devices of the prior art, namely the instability of the plasma and low elimination efficiency due to volume increases and volume changes. Further, because of the plasma torch configuration, the processing gas can be broken down and eliminated with homogeneous efficiency overall. Further, the heat-source concentrating device according to the present invention can create high temperature conditions very economically by concentrating plasma torches and can therefore be employed directly in waste treatment, large-volume scrubbers, high-temperature melting furnaces and the like.

Inventors:
KIM IK NYEON (KR)
CHANG HONG KI (KR)
JI YOUNG YEON (KR)
Application Number:
KR2010/003176
Publication Date:
November 25, 2010
Filing Date:
May 20, 2010
Export Citation:
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Assignee:
TRIPLECORESKOREA (KR)
KIM IK NYEON (KR)
CHANG HONG KI (KR)
JI YOUNG YEON (KR)
International Classes:
F23G5/34; F23D14/38; F23D14/58; F23G5/38
Foreign References:
JPH07127831A1995-05-16
JPH09178152A1997-07-11
JPH0771733A1995-03-17
JPH10169962A1998-06-26
Attorney, Agent or Firm:
KIM, KANG WOOK (KR)
김강욱 (KR)
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Claims: