Invention relates to effusion cell used in Molecular Beam and Cheiϊiical Bean* EpiLaxy jyste-ns including a crucible for ^' source material and a heater for heating the crucible.

Molecular Beam Epitaxy (MBE) is a thin film growth process in which one or e thenr-a-i. beϋ s of atoms or molecules, emanating from solid or liquid source materials, react on the surface of a substrate to form a film. The substrate is held at elevated temperature under ultra high vacuum (UHV) conditions. The substrate determines the crystallinity and orientation of the grown layer. The deposition rate is typically one micrometer per hour with thickness control of tenths of a monolayer and with purity levels of better than ten parts per million. Predetermined doping and compositional profiles can be fabricated in a layer-by- layer manner, with device-quality minority and majority carrier characteristics.

Chemical Beam Epitaxy (CBE) also belongs to the epitaxial technology. In CBE the solid sources employed in conventional MBE are replaced by gaseous sources. Thus CBE combines features of MBE and metalorganic chemical vapor deposition (MOCVD). Being an ultra high vacuum (UHV) technique, CBE possesses the molecular beam nature and the use of all-vapor source simultaneously. Therefore it provides extraordinary versatility in the growth of layered semiconductor systems while permitting the use of phosphorus. CBE has been proven to grow very high quality GalnAsP/InP, one of the most important semiconductor heterostructures practically unattainable by MBE.

The Molecular Beam methods have matured to the point that they are being seriously considered for industrial production of device structures. Semiconductor device fabrication plants will need high throughput systems capable of growing large-area wafers in batches.

Molecular Beam Epitaxy and Chemical Beam Epitaxy systems require ultra high vacuum conditions and equipment of very high quality. However the question of extreme purity is always a problem in all vacuum chamber systems when emanating from solid, liquid or gaseous sources.

To provide a molecular beam of very high purity in the Molecular Beam Epitaxy the Knudsen-type effusion cell is used in the vacuum chamber. For evaporation of solid materials a high temperature is needed and exact temperature stability control is necessary. However especially in effusion cells the high temperatures might cause troubles because in the temperature range up to 1600°C impurities from the cell construction might mix with the molecular beams.

In the Knudsen-type effusion cells the heating of the source material is obtained by different kinds of heating elements. Well-known is an effusion cell where the resistor filament line goes from one end of the cell to another end and back again mainly in the direction of the tubular cell. This kind of resistor is very sensitive to the deformation in high temperatures because of the thermal strain.

Another well-known heater resistor in the effusion cell is a double coil made of wire. The double coil arrangement is the only possibility to prevent the magnetic field effect achieved by this kind of coil. It is because two coils can be made to effect to the opposite directions and so to compensate the dipole fields of the two coils.

However the thin wire coil gives unbalanced heat transmission distribution from the resistor to the crucible. Therefore the temperature difference between the resistor and the outer level of the crucible is remarkably high. The consequence of that situation is that high temperature resistor coil easily causes impurities in to the molecular beam.

The purpose of this invention is to provide a new effusion ceil for Molecular and Cnemical Beam Epitaxy. According to the invention the heater for the crucible mainly consists of two coils made of thin foil ribbons which have been corrugated to make ribbon stiffer.

The benefit of this kind of heater is that the corrugated foil ribbon is mechanically stiff and stable. The heat transmission distribution from the resistor to the crucible is good because the thin foil can cover nearly the whole surface area of the effusion cell. Thus the temperature difference between the resistor and the crucible is insignificant causing almost no impurities in the molecular beam.

The preferred embodiment on the invention is described in the drawings, where

Figure 1 presents a sectional view of the effusion cell. Figure 2 presents the section II-II of the figure 1. Figure 3 presents the heating filaments of the effusion cell. Figure 4 presents an enlarged section of the filament mounting in the effusion cell. Figure 5 presents a cross section V-V of the effusion cell.

The effusion cell in figure 1 is mainly comprised of the supporting structure, means for holding solid sources for emanating and means for heating the solid source. The supporting structure comprises the feedthrough 1, the flange 2, the base rod 3, outer core 12 and inner core 13. Inside the tube formed cores 12 and 13 there is the crucible 27 for holding solid sources to be emanated surrounded by the heating filaments 16a and 16b.

The heating filaments 16a and 16b are resistors which are made of foil ribbons and connected to the electric power

source by the current leads 17a and 17b. Electric current is brought through the flange 2 by cords 29a and 29b which have been attached to the connectors 19a and 19b by screws 18a and 18b.

The effusion cell has a four point connecting plug 30 with two tags 31 for the heating filaments and two tags 32 for the thermoelement. In another sectional view of the effusion cell in the figure 2 the thermoelements 9a and 9b are seen. Thermoelements 9a and 9b measure the temperature of the crucible 27 and they are connected to the tags 32 by cords 33a and 33b.

The figure 3 presents the heating filaments 16a and 16b of the effusion cell. The filaments 16a and 16b are made of foil ribbons of tantalum metal and form two spiral coils which have been bifilarly wound together. In the figure 3 it can be seen that every second round of the coils belongs to the filament 16a and every other round of the coils belongs to the filament 16b. Bifilarly wound filaments create no disturbing magnetic field when electric current is lead to the coils because two opposite coils compensate their dipole fields.

At the end of the heater the both filaments 16a and 16b have been joined to the hot ring 14 also made of foil material. The thickness of the hot ring 14 has been chosen so that the total connecting cross-sectional area in the ring is less than the cross-sectional area of the foil ribbon. Because the ring also acts as a resistor the consequence is that the ring 14 will be slightly hotter than the filament 16a or 16b itself. By this way the orifice of the crucible 27 will be at higher temperature compared to the rest of the crucible. Consequently this arrangement improves the beam quality.

In the figure 4 is presented an enlarged section of the filament coil mounting in the effusion cell. The both

filaments 16a and 16b have been mounted to the grooves 35 between the steps 36 in the filament holder 20. The figure 4 shows also very clearly the cross sectional form of the filament coil 16a. The filament coil 16a is basically a flat stripe that has been wound to the coil so that the cross section is concave or arched. This form makes the filament coil 16a very stable against deformation in high temperatures.

Another advantage of the concave form of the filament 16a arise from that the filament 16a is supported only by its edges. Because -the contact areas between the filament and the holder 20 are very small the heat transfer from the filament to the holder will also be minimized. To make sure that the filament 16a stays in its place the filament has been fitted to the groove 35. During the operation the filament grabs efficiently to the corners 38 because of the thermal expansion.

Figure 5 presents a cross section of the effusion cell. The filament coil 16a is mounted inside the outer core 12 and inner core 13 of the cell. The filament 16a is placed to the grooves 35 between the steps 36 in the filament holder 20. Inside the filament coil 16a the crucible 27 is seen in the figure 5.