Title:
HEATER MEMBER AND SUBSTRATE PROCESSING APPARATUS HAVING SAME
Document Type and Number:
WIPO Patent Application WO/2015/041392
Kind Code:
A1
Abstract:
The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to the present invention comprises: a processing chamber; a substrate susceptor, installed in the processing chamber, which rotates in connection with a rotary shaft, a plurality of substrates being disposed on the same plane thereof; a heater member located on the lower surface of the substrate susceptor; and a spraying member for spraying a gas onto the entire processing surface of the substrate at a position corresponding to each of the plurality of substrates disposed on the substrate susceptor, wherein the heater member has an inner space in which hot wires for heating the substrate susceptor are arranged in a plurality of vertical and horizontal lines in a concentric circle based on the rotary shaft of the substrate susceptor.
Inventors:
BANG HONG JOO (KR)
KIM SANG YEON (KR)
SHIN DONG HWA (KR)
KIM MIN SEOK (KR)
YANG JIN YOUNG (KR)
KIM SANG YEON (KR)
SHIN DONG HWA (KR)
KIM MIN SEOK (KR)
YANG JIN YOUNG (KR)
Application Number:
PCT/KR2014/002385
Publication Date:
March 26, 2015
Filing Date:
March 21, 2014
Export Citation:
Assignee:
KOOKJE ELECTRIC KOREA CO LTD (KR)
International Classes:
H01L21/205; H01L21/683
Foreign References:
| KR20070110736A | 2007-11-20 | |||
| JP2002373862A | 2002-12-26 | |||
| JP2000012548A | 2000-01-14 | |||
| KR20100062942A | 2010-06-10 | |||
| KR20130007149A | 2013-01-18 |
Attorney, Agent or Firm:
KWON, Hyuk-Soo et al. (KR)
κΆνμ (KR)
κΆνμ (KR)
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