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Patent Searching and Data


Title:
HEATER FOR SEMICONDUCTOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/155652
Kind Code:
A1
Abstract:
A heater for a semiconductor manufacturing device having a heating element embedded in an AlN ceramic substrate, wherein the AlN ceramic substrate includes O, C, Ti, Ca, and Y as impurity elements, the mass ratio of Ti/Ca is 0.13 or more, and no TiN phase is found in an XRD profile.

Inventors:
YAMANA, Keita (2-56, Suda-cho, Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
NOBORI, Kazuhiro (2-56, Suda-cho, Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
TORII, Kengo (2-56, Suda-cho, Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
Application Number:
JP2018/025003
Publication Date:
August 15, 2019
Filing Date:
July 02, 2018
Export Citation:
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Assignee:
NGK INSULATORS, LTD. (2-56, Suda-cho Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
International Classes:
C04B35/582; H05B3/10; H05B3/74
Foreign References:
JP2018016517A2018-02-01
JP2004262750A2004-09-24
JPH0977558A1997-03-25
JP2004203647A2004-07-22
Attorney, Agent or Firm:
ITEC INTERNATIONAL PATENT FIRM (SC Fushimi Bldg, 16-26 Nishiki 2-chome, Naka-ku, Nagoya-sh, Aichi 03, 〒4600003, JP)
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