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Patent Searching and Data


Title:
HEIGHT MEASURING AND ESTIMATION METHOD OF UNEVEN SURFACE OF MICROSCOPE SLIDE, AND MICROSCOPE
Document Type and Number:
WIPO Patent Application WO/2018/098833
Kind Code:
A1
Abstract:
A height measuring and estimation method of a slide for a microscope, and microscope using same. By means of height estimation and a slide position in a microscope system, a method of performing continuous scanning to obtain clear images for a high magnifying power is obtained. A standard slide is used as a template to acquire heights of all reference measurement points of another slide under test. The measuring and estimation method is obtained by means of a conversion relationship from a function formula set of position coordinates and heights. The present invention enables accurate measurement and estimation of heights of an uneven surface of a slide, and application of this method of measuring a height of an uneven surface to an automatic scanning microscope, thus realizing a rapid microscopic image scan of a specimen object on a slide.

Inventors:
YIN YUEFENG (CN)
Application Number:
PCT/CN2016/108471
Publication Date:
June 07, 2018
Filing Date:
December 04, 2016
Export Citation:
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Assignee:
YIN YUEFENG (CN)
International Classes:
G02B21/00; G01B11/06
Domestic Patent References:
WO2016179286A12016-11-10
Foreign References:
CN102884395A2013-01-16
CN101949689A2011-01-19
CN101033950A2007-09-12
CN104730702A2015-06-24
US5966214A1999-10-12
CN104730702A2015-06-24
CN102298206A2011-12-28
Other References:
See also references of EP 3385663A4
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