Title:
HIGH FREQUENCY ANTENNA UNIT AND PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2009/110226
Kind Code:
A9
Abstract:
Provided is a high frequency antenna unit which can generate high-density discharge plasma in a vacuum container. The high frequency antenna unit is provided with a high-frequency antenna (11) which makes a high-frequency current to flow; a protection tube (12), which is arranged on the circumference of a part that exists on the high frequency antenna portion in the vacuum container; and a buffer region (13) arranged between the high-frequency antenna (11) and the protection tube (12). The 'buffer region' is a region that suppresses acceleration of electrons, and is formed of, for instance, vacuum or an insulator. Thus, since generation of electrical discharge between the antenna (11) and the protection tube (12) can be suppressed, high-density discharge plasma can be generated in the vacuum container.
Inventors:
SETSUHARA YUICHI (JP)
EBE AKINORI (JP)
EBE AKINORI (JP)
Application Number:
PCT/JP2009/000956
Publication Date:
October 14, 2010
Filing Date:
March 03, 2009
Export Citation:
Assignee:
EMD CORP (JP)
SETSUHARA YUICHI (JP)
EBE AKINORI (JP)
SETSUHARA YUICHI (JP)
EBE AKINORI (JP)
International Classes:
H05H1/46; H01L21/3065
Attorney, Agent or Firm:
KOBAYASI, Ryohei et al. (JP)
Ryohei Kobayashi (JP)
Ryohei Kobayashi (JP)
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