Title:
HIGH-FREQUENCY-PROBE POSITION CORRECTION TECHNOLOGY
Document Type and Number:
WIPO Patent Application WO/2017/203876
Kind Code:
A1
Abstract:
In high-frequency-probe positioning in position calibration carried out in conventional high-frequency characteristic inspection, a prescribed standard pattern for standard alignment is used and probe positions are determined using a microscope and the human eye. However, measurement is influenced by variation in the contact positions of high-frequency probes and a DUT, variation in the amount of pressing of the DUT, and electromagnetic fields spreading in space, and each of these factors is highly dependent on how the measurement work is carried out. Accuracy has been 10 μm at most, and there have been problems with the reliability of measurement results and the reproducibility of measurements. In the present invention, S-parameter feedback measurement values measured while emitting high-frequency waves and finely moving high-frequency probe positions in the Z direction, X direction, and Y direction in relation to a prescribed reference device are analyzed to determine probe positions in each direction, and probe positions at the electrical center position of a planar circuit are calibrated with an accuracy of 2 μm or less.
Inventors:
SAKAMAKI RYO (JP)
Application Number:
PCT/JP2017/014970
Publication Date:
November 30, 2017
Filing Date:
April 12, 2017
Export Citation:
Assignee:
AIST (JP)
International Classes:
G01R27/28; G01R1/073; G01R31/28; G01R35/00
Foreign References:
| JP2005134399A | 2005-05-26 | |||
| US20080036469A1 | 2008-02-14 | |||
| JP2010281639A | 2010-12-16 |
Other References:
February 2010 (2010-02-01), Retrieved from the Internet [retrieved on 20170613]
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