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Title:
HIGH-PERMEABILITY BOTTOM FILM FOR PAPER DIAPER AND PROCESSING TECHNIQUE THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/273215
Kind Code:
A1
Abstract:
Disclosed are a high-permeability bottom film for a paper diaper and a processing technique therefor, which relate to the field of paper diaper processing. The bottom film is made by combining a short-cut breathable film and a resistant film. The breathable film is located on the surface of the bottom film. The resistant film is made of an SMS non-woven fabric, and the SMS non-woven fabric is subject to a resistance treatment by using a finishing liquid. An activated film having a barrier function is formed on the surface of the SMS non-woven fabric. The finishing liquid comprises a fluorine finishing agent, an antistatic agent, a penetrant and a cross-linking agent which are matched in proportion. The resistant film and the short-cut breathable film are used in combination to form the bottom film, and the breathable film is only distributed at the hip position of an infant. When ensuring breathability for the infant, the usage amount of the breathable film is effectively reduced by 50%. The resistant film is made of an SMS non-woven fabric formed by treating with a finishing liquid. A layer of activated film is formed on the surface, so that the critical tension on the surface of the bottom film is reduced, the water permeation resistance is increased, and the leakage risk of the paper diaper is reduced.

Inventors:
CUI MIN (CN)
LING XIN (CN)
GAO HENGYAO (CN)
Application Number:
PCT/CN2021/139442
Publication Date:
January 05, 2023
Filing Date:
December 19, 2021
Export Citation:
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Assignee:
FUJIAN HENGAN HOLDING CO LTD (CN)
International Classes:
A61F13/514; A61F13/494; A61F13/496; A61F13/511; D04H1/544; D04H1/559; D06M11/00; D06M13/00; D06M15/00; D06M101/20
Foreign References:
CN113288595A2021-08-24
CN209059685U2019-07-05
CN112030362A2020-12-04
CN110680618A2020-01-14
CN102321978A2012-01-18
EP1048279A22000-11-02
Attorney, Agent or Firm:
NUODE IP LAW FIRM (CN)
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