Title:
HIGH-REFRACTIVE INDEX SILICON HYDRIDE THIN FILM, PREPARATION METHOD THEREFOR, FILTER STACK, AND OPTICAL FILTER
Document Type and Number:
WIPO Patent Application WO/2019/085265
Kind Code:
A1
Abstract:
A high-refractive index silicon hydride thin film, a preparation method therefor, a filter stack, and an optical filter, relating to the field of thin-film optics. The preparation method comprises the steps of: (a) depositing Si on a substrate by means of magnetron Si sputtering to form a silicon thin film; (b) exposing the silicon thin film to an environment containing reactive hydrogen and reactive oxygen to form an oxygen-containing silicon hydride thin film, wherein the quantity of reactive oxygen species accounts for 4% to 99% of the total quantity of reactive hydrogen and reactive oxygen species, or alternatively, exposing the silicon thin film in an environment containing reactive hydrogen and reactive nitrogen to form a nitrogen-containing thin film, wherein the quantity of reactive nitrogen species accounts for 5% to 20% of the total quantity of reactive hydrogen and reactive nitrogen species. The preparation method conducts sputtering and reaction steps separately, first depositing Si on a substrate by means of magnetron Si sputtering before reacting a reactive hydrogen and reactive oxygen/nitrogen plasma with the silicon to obtain SiH containing oxygen or nitrogen. Not only does this avoid target poisoning, but the SiH thin films thus prepared have a high refractive index and low absorptance.
Inventors:
ZHANG RUIZHI (CN)
TANG JIAN (CN)
WANG YING (CN)
YU HUI (CN)
LU ZHANGWU (CN)
XU ZHENGCHI (CN)
ZHANG QIBIN (CN)
TANG JIAN (CN)
WANG YING (CN)
YU HUI (CN)
LU ZHANGWU (CN)
XU ZHENGCHI (CN)
ZHANG QIBIN (CN)
Application Number:
PCT/CN2018/071606
Publication Date:
May 09, 2019
Filing Date:
January 05, 2018
Export Citation:
Assignee:
ZHEJIANG CRYSTAL OPTECH CO LTD (CN)
International Classes:
C23C14/14; C23C14/35; C23C14/58; G02B1/10
Foreign References:
CN107209306A | 2017-09-26 | |||
CN104471449A | 2015-03-25 | |||
CN101328574A | 2008-12-24 | |||
CN101805891A | 2010-08-18 | |||
EP0582228A1 | 1994-02-09 |
Attorney, Agent or Firm:
CHOFN INTELLECTUAL PROPERTY (CN)
Download PDF:
Previous Patent: WATER-ABSORBING SECONDARY CYCLONE DUST SEPARATOR CUP, AND VACUUM CLEANER PROVIDED THEREWITH
Next Patent: GATE DRIVE CIRCUIT
Next Patent: GATE DRIVE CIRCUIT