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Title:
HIGH-REFRACTIVE INDEX SILICON HYDRIDE THIN FILM, PREPARATION METHOD THEREFOR, FILTER STACK, AND OPTICAL FILTER
Document Type and Number:
WIPO Patent Application WO/2019/085265
Kind Code:
A1
Abstract:
A high-refractive index silicon hydride thin film, a preparation method therefor, a filter stack, and an optical filter, relating to the field of thin-film optics. The preparation method comprises the steps of: (a) depositing Si on a substrate by means of magnetron Si sputtering to form a silicon thin film; (b) exposing the silicon thin film to an environment containing reactive hydrogen and reactive oxygen to form an oxygen-containing silicon hydride thin film, wherein the quantity of reactive oxygen species accounts for 4% to 99% of the total quantity of reactive hydrogen and reactive oxygen species, or alternatively, exposing the silicon thin film in an environment containing reactive hydrogen and reactive nitrogen to form a nitrogen-containing thin film, wherein the quantity of reactive nitrogen species accounts for 5% to 20% of the total quantity of reactive hydrogen and reactive nitrogen species. The preparation method conducts sputtering and reaction steps separately, first depositing Si on a substrate by means of magnetron Si sputtering before reacting a reactive hydrogen and reactive oxygen/nitrogen plasma with the silicon to obtain SiH containing oxygen or nitrogen. Not only does this avoid target poisoning, but the SiH thin films thus prepared have a high refractive index and low absorptance.

Inventors:
ZHANG RUIZHI (CN)
TANG JIAN (CN)
WANG YING (CN)
YU HUI (CN)
LU ZHANGWU (CN)
XU ZHENGCHI (CN)
ZHANG QIBIN (CN)
Application Number:
PCT/CN2018/071606
Publication Date:
May 09, 2019
Filing Date:
January 05, 2018
Export Citation:
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Assignee:
ZHEJIANG CRYSTAL OPTECH CO LTD (CN)
International Classes:
C23C14/14; C23C14/35; C23C14/58; G02B1/10
Foreign References:
CN107209306A2017-09-26
CN104471449A2015-03-25
CN101328574A2008-12-24
CN101805891A2010-08-18
EP0582228A11994-02-09
Attorney, Agent or Firm:
CHOFN INTELLECTUAL PROPERTY (CN)
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