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Patent Searching and Data


Title:
HIGH REPELLENCY MATERIALS VIA NANOTOPOGRAPHY AND POST TREATMENT
Document Type and Number:
WIPO Patent Application WO/2010/073153
Kind Code:
A3
Abstract:
A method is provided for making a high repellency material. In one embodiment the method includes the steps of providing a polymeric material having an external surface including particle-like nanotopography, etching the external surface with a high energy treatment; and depositing a fluorochemical onto the etched external surface by a plasma fluorination process.

Inventors:
QUINCY III ROGER B (US)
YAHIAOUI ALI (US)
Application Number:
PCT/IB2009/055343
Publication Date:
September 30, 2010
Filing Date:
November 25, 2009
Export Citation:
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Assignee:
KIMBERLY CLARK CO (US)
QUINCY III ROGER B (US)
YAHIAOUI ALI (US)
International Classes:
B01J19/08; B82B3/00; C09K3/18
Foreign References:
KR20070006991A2007-01-12
US20030134515A12003-07-17
Other References:
YAN, Y. H. ET AL.: "CF4 Plasma Treatment of Poly(dimethylsiloxane): Effect of Fillers and Its Application to High-Aspect-Ratio UV Embossing", LANGMUIR, vol. 21, 13 September 2005 (2005-09-13), pages 8905 - 8912
TSOUGENI, KATERINA ET AL.: "Tunable Poly(dimethylsiloxane) Topography in 02 or Ar Plasmas for Controlling Surface Wetting Properties and Their Ageing", JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 46, 8 February 2007 (2007-02-08), pages 744 - 750
WOODWARD, I. ET AL.: "Super-hydrophobic Surfaces Produced by Plasma Fluorination of Polybutadiene Films", LANGMUIR, vol. 19, 15 April 2003 (2003-04-15), pages 3432 - 3438
DENIS, F. A. ET AL.: "Protein Adsorption on Model Surfaces with Controlled Nanotopography and Chemistry", LANGMUIR, vol. 18, 5 February 2002 (2002-02-05), pages 819 - 828
See also references of EP 2373410A4
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