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Title:
HIGH THROUGHPUT INSPECTION SYSTEM AND METHOD FOR GENERATING TRANSMITTED AND/OR REFLECTED IMAGES
Document Type and Number:
WIPO Patent Application WO2004015404
Kind Code:
A3
Abstract:
Inspection system (10) and method for high-throughput inspection of an object (8) such as a reticle or photomask, the system and method is capable to generate and sense transmitted and/or reflected short duration beams (15, 17). According to one embodiment of the invention the transmitted and reflected short duration beams are generated and sensed simultaneously thus provide a reflected image and a transmitted image simultaneously. The reflected and transmitted short duration radiation beams are manipulated either in the frequency domain or are distinctly polarized such that they are directed to the appropriate area sensors (32, 34). According to another aspect of the invention the system changes the manipulation of a short duration beam of radiation to selectively direct the short duration beam to distinct area sensors thereby increasing the throughput of the inspection system (10). The system (10) and method enable simple comparison between transmitted and reflected images of an area (AR9) and accordingly eliminate the need for performing registration between said images.

Inventors:
ELYASAF EMANUEL (IL)
FELDMAN HAIM (IL)
YALOV SIMON (IL)
LAHAT EITAN (IL)
Application Number:
PCT/US2003/024946
Publication Date:
May 13, 2004
Filing Date:
August 06, 2003
Export Citation:
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Assignee:
APPLIED MATERIALS INC (US)
APPLIED MATERIALS ISRAEL LTD (IL)
ELYASAF EMANUEL (IL)
FELDMAN HAIM (IL)
YALOV SIMON (IL)
LAHAT EITAN (IL)
International Classes:
G01N21/88; G01N21/956; (IPC1-7): G01N21/956; H01L21/66; G01N21/21; G01N21/88
Foreign References:
EP0819933A21998-01-21
US5191393A1993-03-02
US6175645B12001-01-16
EP0557227A21993-08-25
US20020012376A12002-01-31
US5386112A1995-01-31
Other References:
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 21 3 August 2001 (2001-08-03)
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