Title:
HIGH-ZIRCONIA ELECTRO-FUSED CAST REFRACTORY MATERIAL
Document Type and Number:
WIPO Patent Application WO/2023/182007
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a high-zirconia electro-fused cast refractory material which is prevented from the opening of a joint at a contacting part between refractory materials, is also prevented from the generation of zircon crystals, does not undergo the extreme increase in a residual volume expansion ratio even when zircon crystals are generated, and has high corrosion resistance against a glass. The present invention relates to a high-zirconia electro-fused cast refractory material, in which, with respect to chemical components, the total content of ZrO2 and HfO2 is more than 80% by mass and 92% by mass or less, the content of Al2O3 is 0.2-3.0% by mass, the content of SiO2 is 1.5-10% by mass, the content of Na2O is 0.05-2.0% by mass, the content of K2O is 1.0% by mass or less, the content of B2O3 is 0-1.5% by mass, the content of Y2O3 is more than 4.0% by mass and 9.0% by mass or less, the total content of MgO and CaO is 0.02-0.4% by mass, the content of CaO is 0.01% by mass or more, the total content of Fe2O3 and TiO2 is 0.5% by mass or less, and the content of P2O5 is 0.04% by mass or less.
Inventors:
AKAMATSU HAYATO (JP)
ABE KOYA (JP)
SUGIYAMA HIROSHI (JP)
HASHIMOTO ITARU (JP)
ABE KOYA (JP)
SUGIYAMA HIROSHI (JP)
HASHIMOTO ITARU (JP)
Application Number:
PCT/JP2023/009390
Publication Date:
September 28, 2023
Filing Date:
March 10, 2023
Export Citation:
Assignee:
SAINT GOBAIN TM K K (JP)
International Classes:
C04B35/484; C04B35/657; F27D1/00
Domestic Patent References:
WO2017115698A1 | 2017-07-06 | |||
WO2016013384A1 | 2016-01-28 | |||
WO2016068111A1 | 2016-05-06 | |||
WO2016006531A1 | 2016-01-14 |
Foreign References:
JP2021506715A | 2021-02-22 | |||
JP2018509363A | 2018-04-05 | |||
JPH0442813A | 1992-02-13 | |||
JP2014505005A | 2014-02-27 | |||
JP2020536834A | 2020-12-17 | |||
JP2013043811A | 2013-03-04 |
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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