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Patent Searching and Data


Title:
HIGHLY ABRASION-RESISTANT IMPRINT MATERIAL
Document Type and Number:
WIPO Patent Application WO/2011/132616
Kind Code:
A1
Abstract:
Provided is a highly abrasion-resistant imprint material. The imprint material comprises a compound that has C2-3 alkylene oxide units and at least two polymerizable groups as component (A) and a photopolymerization initiator as component (B). The polymerizable groups are at least one selected from the group consisting of acryloyloxy, acryloyl, methacryloyloxy, and methacryloyl groups. The imprint material can further comprise, in addition to component (A), a compound that has at least two polymerizable groups but does not have C2-3 alkylene oxide units as component (A').

Inventors:
KOBAYASHI JUNPEI (JP)
KATO TAKU (JP)
SHUTO KEISUKE (JP)
SUZUKI MASAYOSHI (JP)
Application Number:
JP2011/059420
Publication Date:
October 27, 2011
Filing Date:
April 15, 2011
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
KOBAYASHI JUNPEI (JP)
KATO TAKU (JP)
SHUTO KEISUKE (JP)
SUZUKI MASAYOSHI (JP)
International Classes:
H01L21/027; C08F2/50; C08F20/28; C08F299/02
Domestic Patent References:
WO2007029542A12007-03-15
WO2009101758A12009-08-20
Foreign References:
JPH1180293A1999-03-26
JPH10182745A1998-07-07
JP2008238416A2008-10-09
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
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Claims: