Title:
HIGHLY ACID-RESISTANT, HYDRATION-RESISTANT MAGNESIUM OXIDE PARTICLES AND RESIN COMPOSITIONS
Document Type and Number:
WIPO Patent Application WO/2001/010958
Kind Code:
A1
Abstract:
Magnesium oxide particles whose surfaces are treated with an acid phosphate ester represented by the general formula (1) and which exhibit high acid resistance and high hydration resistance; and synthetic resin compositions containing the magnesium oxide particles (wherein n is 1 or 2; and R is C¿4?-C¿30? alkyl or C¿4?-C¿30? alkenyl). The resin compositions permit high magnesium oxide contents and are excellent in fluidity and easy of molding. Articles molded from the compositions have high acid resistance and high hydration resistance, thus being valuable as materials of electronic or electrical components.
Inventors:
ANABUKI HITOSHI (JP)
Application Number:
PCT/JP2000/005147
Publication Date:
February 15, 2001
Filing Date:
July 31, 2000
Export Citation:
Assignee:
KYOWA CHEM IND CO LTD (JP)
ANABUKI HITOSHI (JP)
ANABUKI HITOSHI (JP)
International Classes:
C08K9/04; C09C1/02; H01B1/08; H01L23/29; (IPC1-7): C09C1/02; C01F5/02; C08K9/04; C08L101/00; C09C3/08; H01B3/00; H01B3/30; H01L23/29
Foreign References:
| JPS59170131A | 1984-09-26 | |||
| JPH08169991A | 1996-07-02 | |||
| JPS63265960A | 1988-11-02 | |||
| JPS6433157A | 1989-02-03 | |||
| JPH06171928A | 1994-06-21 | |||
| JPH0563116A | 1993-03-12 |
Attorney, Agent or Firm:
Ohshima, Masataka (Yotsuya 4-chome Shinjuku-ku Tokyo, JP)
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