Title:
HIGHLY PURIFIED LIQUID PERFLUORO-N-ALKANES AND METHOD FOR PREPARING
Document Type and Number:
WIPO Patent Application WO2005087693
Kind Code:
A3
Abstract:
The present invention is drawn to liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid perfluoro-n-alkanes of the invention are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength
Inventors:
WHELAND CLAYTON ROBERT (US)
FRENCH ROGER HARQUAIL (US)
FRENCH ROGER HARQUAIL (US)
Application Number:
PCT/US2005/007933
Publication Date:
November 10, 2005
Filing Date:
March 08, 2005
Export Citation:
Assignee:
DU PONT (US)
WHELAND CLAYTON ROBERT (US)
FRENCH ROGER HARQUAIL (US)
WHELAND CLAYTON ROBERT (US)
FRENCH ROGER HARQUAIL (US)
International Classes:
C07C17/389; C07C19/08; G03F7/20; (IPC1-7): C07C19/08; C07C17/389
Other References:
KUNZ R R ET AL: "TRANSPARENT FLUIDS FOR 157-NM IMMERSION LITHOGRAPHY", JOURNAL OF MICROLITHOGRAPHY, MICROFABRICATION AND MICROSYSTEMS, SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, BELLINGHAM, US, vol. 3, no. 1, January 2004 (2004-01-01), pages 73 - 83, XP001182259, ISSN: 1537-1646
DATABASE INSPEC [online] THE INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB; 2001, BOHER P ET AL: "Precise characterization of resists and thin gate dielectrics in the VUV range for 157 nm lithography", XP002342146, Database accession no. 7293526
E. ALBRECHT ET AL.: "VUV Absorbing vapours in n-perfluorocarbons", EUROPEAN ORGANIZATION FOR NUCLEAR SEARCH, 16 December 2002 (2002-12-16), pages 1 - 14, XP002341878, Retrieved from the Internet
Y. ANDRES ET AL.: "Cleaning and recirculation of perfluorohexane in the STAR-RICH detector", NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, vol. 486, 2002, pages 590 - 609, XP002341879
DATABASE INSPEC [online] THE INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB; 2001, BOHER P ET AL: "Precise characterization of resists and thin gate dielectrics in the VUV range for 157 nm lithography", XP002342146, Database accession no. 7293526
E. ALBRECHT ET AL.: "VUV Absorbing vapours in n-perfluorocarbons", EUROPEAN ORGANIZATION FOR NUCLEAR SEARCH, 16 December 2002 (2002-12-16), pages 1 - 14, XP002341878, Retrieved from the Internet
Y. ANDRES ET AL.: "Cleaning and recirculation of perfluorohexane in the STAR-RICH detector", NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, vol. 486, 2002, pages 590 - 609, XP002341879
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