Title:
HIGHLY SCRATCH-RESISTANT IMPRINT MATERIAL CONTAINING URETHANE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2012/099164
Kind Code:
A1
Abstract:
[Problem] To provide an imprint material capable of forming a film which exhibits high scratch resistance even after a pattern has been transferred thereto, specifically, an imprint material capable of forming a film such that, when the film is patterned by transferring and then subjected to a steel wool scratch test, few scratch marks are observed. [Solution] An imprint material which comprises (A) a compound that has at least one ethylene oxide unit and at least one polymerizable group, (B) a urethane compound that has at least one long-chain alkyl group having 13 to 25 carbon atoms and at least one polymerizable group and that is modified with polycaprolactone, and (C) a photopolymerization initiator.
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Inventors:
KOBAYASHI, Junpei (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
小林 淳平 (〒52 千葉県船橋市鈴身町488番地6 日産化学工業株式会社 電子材料研究所内 Chiba, 〒2740052, JP)
SHUTO, Keisuke (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
首藤 圭介 (〒52 千葉県船橋市鈴身町488番地6 日産化学工業株式会社 電子材料研究所内 Chiba, 〒2740052, JP)
小林 淳平 (〒52 千葉県船橋市鈴身町488番地6 日産化学工業株式会社 電子材料研究所内 Chiba, 〒2740052, JP)
SHUTO, Keisuke (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
首藤 圭介 (〒52 千葉県船橋市鈴身町488番地6 日産化学工業株式会社 電子材料研究所内 Chiba, 〒2740052, JP)
Application Number:
JP2012/050960
Publication Date:
July 26, 2012
Filing Date:
January 18, 2012
Export Citation:
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda-Nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町三丁目7番地1 Tokyo, 〒1010054, JP)
KOBAYASHI, Junpei (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
小林 淳平 (〒52 千葉県船橋市鈴身町488番地6 日産化学工業株式会社 電子材料研究所内 Chiba, 〒2740052, JP)
SHUTO, Keisuke (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町三丁目7番地1 Tokyo, 〒1010054, JP)
KOBAYASHI, Junpei (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
小林 淳平 (〒52 千葉県船橋市鈴身町488番地6 日産化学工業株式会社 電子材料研究所内 Chiba, 〒2740052, JP)
SHUTO, Keisuke (Ltd. Electronic Materials Research Laboratories 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
International Classes:
H01L21/027; B29C59/02; C08F2/50; C08F290/06; C08F299/02; C08G18/67; G02F1/1333; B29K75/00
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (Shin-Ochanomizu Urban Trinity 2, Kandasurugadai 3-chome, Chiyoda-k, Tokyo 62, 〒1010062, JP)
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Claims:
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