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Title:
HOLDING MATERIAL FOR GAS-PROCESSING DEVICE, GAS-PROCESSING DEVICE, AND METHOD RELATING TO SAME
Document Type and Number:
WIPO Patent Application WO/2013/153900
Kind Code:
A1
Abstract:
Provided are: a holding material for a gas-processing device, the holding material achieving appropriate management of the frictional resistance between the holding material and the casing; a gas-processing device; and a method relating to same. This gas-processing method, which processes gas using a gas-processing device provided with a processing structure (20), a metal casing (30) for housing the processing structure, and an inorganic fiber holding material (10) that is disposed between the processing structure and the casing, disposes an organic polymer (40) between the holding material and the casing so as to contact the outer surface (11) of the holding material and the inner surface (31) of the casing during processing of the gas. The gas is processed under the condition that the temperature of the casing is at or above the softening temperature of the organic polymer and less than the decomposition temperature of the organic polymer.

Inventors:
MAKABE HIROSHI (JP)
NAKAMURA HIROKI (JP)
SATOH JUNYA (JP)
ABE ISAMI (JP)
NAKASHIMA AKIHIRO (JP)
Application Number:
PCT/JP2013/057070
Publication Date:
October 17, 2013
Filing Date:
March 13, 2013
Export Citation:
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Assignee:
NICHIAS CORP (JP)
International Classes:
B01D53/86; F01N3/28; B01J33/00
Foreign References:
JP2009041499A2009-02-26
JP2008291801A2008-12-04
JP2010174645A2010-08-12
JP2010112267A2010-05-20
JP2001521847A2001-11-13
JP2007504385A2007-03-01
JP2011231774A2011-11-17
Other References:
See also references of EP 2837787A4
Attorney, Agent or Firm:
HARUKA PATENT & TRADEMARK ATTORNEYS (JP)
Patent business corporation far international patent firm (JP)
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