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Title:
HOLLOW PARTICLES, PRODUCTION METHOD THEREFOR, AND AQUEOUS DISPERSION CONTAINING HOLLOW PARTICLES
Document Type and Number:
WIPO Patent Application WO/2020/066623
Kind Code:
A1
Abstract:
Provided are hollow particles that are light and have better heat resistance and dispersibility than conventional particles, a production method therefor, and an aqueous dispersion containing the hollow particles. The hollow particles are characterized in that: the hollow particles comprise hollow resin particles having surfaces covered with inorganic fine particles; the volume average particle size is 0.1 to 9.0 µm; the porosity is 55 to 95%; repeating units constituting the resin in the hollow resin particles include crosslinkable monomer units and the content of the crosslinkable monomer units is 25 to 100 parts by mass per 100 parts by mass of the resin; the inorganic fine particles have a primary particle size of 10 to 120 nm; and the inorganic fine particles are contained in an amount of 5 to 180 parts by mass relative to 100 parts by mass of the hollow resin particles.

Inventors:
HIRATA TAKESHI (JP)
YABUKI NOZOMI (JP)
Application Number:
PCT/JP2019/035698
Publication Date:
April 02, 2020
Filing Date:
September 11, 2019
Export Citation:
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Assignee:
ZEON CORP (JP)
International Classes:
B01J13/22; C08F220/10; C08J7/04
Domestic Patent References:
WO2018025575A12018-02-08
Foreign References:
JP2012007056A2012-01-12
JP2005206752A2005-08-04
JP2009108146A2009-05-21
JP2014122147A2014-07-03
JP2009108146A2009-05-21
JP2012007056A2012-01-12
US20100048394A12010-02-25
Other References:
"Kagaku Binran, Kiso Hen, Kaitei 4 Ban", 30 September 1993, MARUZEN PUBLISHING CO., LTD., pages: II-498 - 11,503
See also references of EP 3858473A4
Attorney, Agent or Firm:
KISHIMOTO, Tatsuhito et al. (JP)
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