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Patent Searching and Data


Title:
PHOTO−CURING HOLLOW STRUCTURE AND CURING METHOD FOR THE HOLLOW STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2003/006766
Kind Code:
A1
Abstract:
A photo−curing hollow structure, comprising an inner bag layer (2) allowing fluid to be force−fed therein, a base material layer (3) overlaid on the outer peripheral surface of the inner bag layer (2) and impregnated with photo−cured resin, and a translucent cover layer (4) overlaid on the outer peripheral surface of the base material layer (3), the base material layer (3) further comprising a composite member (9) functioning as fiber−reinforced layer impregnated with photo−cured resin and a lattice−like net (10) installed overlappingly on the composite member to prevent the photo−cured resin from flowing.

Inventors:
NAKAMURA TETSUYA (JP)
Application Number:
PCT/JP2002/006854
Publication Date:
January 23, 2003
Filing Date:
July 05, 2002
Export Citation:
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Assignee:
SAKURA RUBBER (JP)
NAKAMURA TETSUYA (JP)
International Classes:
B29C35/08; B29C49/00; B29C69/02; E04H15/20; B29C70/08; B29C70/42; B29C70/44; B29C70/54; B29C71/04; B29D22/02; B32B5/28; C08J5/24; E04H15/44; (IPC1-7): E04H15/20; B29D22/00
Foreign References:
JP2916330B21999-07-05
JPH05302400A1993-11-16
JPS5979125U1984-05-29
JP2728081B21998-03-18
US5728633A1998-03-17
Other References:
See also references of EP 1416107A4
Attorney, Agent or Firm:
Suzuye, Takehiko c/o SUZUYE & SUZUYE (7-2 Kasumigaseki 3-chom, Chiyoda-ku Tokyo, JP)
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