Title:
HYDROGENATION TREATMENT METHOD AND HYDROGENATION TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/015187
Kind Code:
A1
Abstract:
The hydrogenation treatment method of the invention comprises a step for preparing a plasma generating part (20), a step for preparing an airtight member (30), a step for disposing an amorphous silicon film (S) in the airtight member (30), and a step for performing plasma treatment of the amorphous silicon film (S) by causing the plasma generating part (20) to generate plasma in a hydrogen gas-containing gas near atmospheric pressure in a region that is at least a portion of the inside of the airtight member (30). Ideally, the step for disposing the amorphous silicon film (S) includes a step for forming the amorphous silicon film (S) inside the airtight member (30) using a solution in which a silane compound has been dissolved.
Inventors:
KITANO KATSUHISA (JP)
Application Number:
PCT/JP2012/068301
Publication Date:
January 31, 2013
Filing Date:
July 19, 2012
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
KITANO KATSUHISA (JP)
KITANO KATSUHISA (JP)
International Classes:
H01L21/324; H01L21/20; H01L21/208; H01L21/22; H01L21/265
Domestic Patent References:
| WO2007049402A1 | 2007-05-03 |
Foreign References:
| JP2004296729A | 2004-10-21 | |||
| JP2010056483A | 2010-03-11 |
Attorney, Agent or Firm:
MAEI Hiroyuki (JP)
Hiroyuki Maei (JP)
Hiroyuki Maei (JP)
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Claims:
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