Title:
HYDROPHILIC COMPOUND REMOVAL METHOD AND ODOR REMOVAL METHOD
Document Type and Number:
WIPO Patent Application WO/2019/156037
Kind Code:
A1
Abstract:
Provided is a method for removing C4–20 hydrophilic compounds. A hydrophilic compound removal method that is characterized by including a step (a) for radiating 0.1–500 kGy radiation at a composition that includes C4–20 hydrophilic compounds and thereby removing the hydrophilic compounds from the composition.
Inventors:
TSUJI MASAYUKI (JP)
YAMANAKA TAKU (JP)
YAMANAKA TAKU (JP)
Application Number:
PCT/JP2019/003935
Publication Date:
August 15, 2019
Filing Date:
February 05, 2019
Export Citation:
Assignee:
DAIKIN IND LTD (JP)
International Classes:
C08J3/28; A61L9/18; C08F6/00; C08F14/18
Domestic Patent References:
| WO2018026012A1 | 2018-02-08 | |||
| WO2018026017A1 | 2018-02-08 |
Foreign References:
| JP2005523964A | 2005-08-11 | |||
| JP2005154277A | 2005-06-16 | |||
| JP2007083096A | 2007-04-05 | |||
| JP2003040805A | 2003-02-13 | |||
| JP2002327089A | 2002-11-15 | |||
| JPH02501543A | 1990-05-31 | |||
| US20130303650A1 | 2013-11-14 | |||
| US20130303652A1 | 2013-11-14 | |||
| JP2002327068A | 2002-11-15 |
Attorney, Agent or Firm:
YASUTOMI & ASSOCIATES (JP)
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