ICP ANTENNA AND PLASMA TREATMENT DEVICE

WIPO Patent Application WO/2019/074233

A1

A plasma treatment device according to the present invention comprises: an induction chamber into which a source gas is introduced in order to generate plasma therein; a treatment chamber in which a treatment target substrate is arranged and treated by the plasma generated by the induction chamber; an ICP antenna arranged outside the induction chamber so as to form an induction magnetic field in order to generate plasma from the source gas introduced into the induction chamber; and a high-frequency oscillator for applying RF power to the ICP antenna. The ICP antenna comprises a plurality of helical antennas having the same length and the same radial center. Each antenna has an input terminal to which the high-frequency oscillator is connected, and an output terminal connected to a ground as a terminal facing the input terminal. A balanced capacitor is mounted on the output terminal of each antenna such that a virtual ground is formed at the longitudinal center of each antenna. The plurality of helical antennas are configured such that the input terminals and the output terminals of the plurality of helical antennas are arranged at the same angle with regard to the radial center, and the longitudinal centers of the plurality of helical antennas are arranged between the output terminals of the plurality of helical antennas.

JO JEONG HEE (KR)
CHOI YOON SEOK (KR)
SERGEY ZARETSKIY (RU)
YOO CHA YOUNG (KR)

PCT/KR2018/011691

April 18, 2019

October 02, 2018

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EUGENE TECHNOLOGY CO LTD (KR)

H01J37/32

KR20100049208A	2010-05-12
JP2011146721A	2011-07-28
KR100338057B1	2002-05-24
JP2010135298A	2010-06-17
KR20120004040A	2012-01-12

JEONG, Seong-Jin (KR)

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