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Patent Searching and Data


Title:
ILLUMINATION OPTICAL SYSTEM, ALIGNER, AND PROCESS FOR FABRICATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/044307
Kind Code:
A1
Abstract:
An illumination distribution on a surface to be irradiated and a pupil intensity distribution at each point on the surface to be irradiated can be regulated, respectively, to desired distributions.  An illumination optical system, for illuminating the surfaces (M; W) to be irradiated based on the light from a light source (LS), comprises a spatial light modulator (3) having a plurality of optical elements arranged two-dimensionally and controlled individually, a focusing optical system (4) for forming based on the light passed through the spatial light modulator a predetermined light intensity distribution on a surface (5a) providing Fourier transform optically with respect to a surface where the plurality of optical elements are arranged, an optical integrator (5) having a plurality of unit wave front splitting surfaces arranged two-dimensionally on the surface providing Fourier transform, and a control section (CR) for regulating the pupil intensity distribution formed on the illumination pupil to a desired distribution based on the light from the spatial light modulator, and controlling the spatial light modulator in order to regulate the light intensity distribution formed on each of the plurality of unit wave front splitting surfaces, respectively, to a required distribution.

Inventors:
TANITSU OSAMU (JP)
NOBORU MICHIO (JP)
Application Number:
JP2009/064103
Publication Date:
April 22, 2010
Filing Date:
August 10, 2009
Export Citation:
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Assignee:
NIKON CORP (JP)
TANITSU OSAMU (JP)
NOBORU MICHIO (JP)
International Classes:
H01L21/027; G03F7/20
Foreign References:
JP2007227918A2007-09-06
EP1975724A12008-10-01
JP2003022967A2003-01-24
JP2007505488A2007-03-08
JP2002353105A2002-12-06
JPH113849A1999-01-06
Attorney, Agent or Firm:
YAMAGUCHI TAKAO (JP)
Takao Yamaguchi (JP)
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