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Patent Searching and Data


Title:
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/073801
Kind Code:
A1
Abstract:
An illumination optical system, an exposure apparatus, and a device manufacturing method which can adjust the light intensity distribution on the plane to be illuminated.  The illumination optical system includes: an optical integrator (26) which has a plurality of cylindrical lens surfaces (54) arranged in an incident plane intersecting the optical axis of the illumination optical system and a plurality of cylindrical lens surfaces (55) arranged in an emission plane intersecting the optical axis further to the emission side than the cylindrical lens surfaces (54), and which forms a predetermined light intensity distribution on an illumination pupil plane (27) in the illumination optical path of the illumination optical system when the exposure light (EL) is incident; and a light shielding unit (66) which is arranged at the incident side of each of the cylindrical lens surfaces (54) and shields a part of the exposure light (EL) incident on some of the cylindrical lens surfaces (54).  The light shielding unit (66) has light shielding members (68, 69) having a length in the Y-axis direction greater than the width in the Z-axis direction intersecting the Y-axis direction in the plane intersecting the optical axis.

Inventors:
TANAKA, Hirohisa (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
Application Number:
JP2009/067925
Publication Date:
July 01, 2010
Filing Date:
October 16, 2009
Export Citation:
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Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo, 31, 〒1008331, JP)
株式会社 ニコン (〒31 東京都千代田区丸の内3丁目2番3号 Tokyo, 〒1008331, JP)
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
ONDA, Hironori et al. (12-1, Ohmiya-cho 2-chome Gifu-sh, Gifu 31, 〒5008731, JP)
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