Title:
ILLUMINATION SYSTEM, IN PARTICULAR FOR A PROJECTION EXPOSURE MACHINE IN SEMICONDUCTOR LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2006079486
Kind Code:
A3
Abstract:
An illumination system is provided with a light produced by a light source (1) , with an optical axis and with optical elements (3, 7), in particular for a projection exposure machine in semiconductor lithography, having at least one optical element (3, 7) for producing a pupil distribution of the light beam, and having a homogenizing element (10, 24) for .homogenizing the intensity of the light. For an asymmetric pupil distribution at least the optical elements (3, 7) that produce non-rotationally symmetrical light distributions, and/or the homogenizing element (10, 24) ) are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x' -/y' -coordinate system newly formed by the rotational angle a by means of rotating the x-/y- coordinate system by the angle a.
Inventors:
BROTSACK MARKUS (DE)
Application Number:
PCT/EP2006/000535
Publication Date:
October 05, 2006
Filing Date:
January 21, 2006
Export Citation:
Assignee:
ZEISS CARL SMT AG (DE)
BROTSACK MARKUS (DE)
BROTSACK MARKUS (DE)
International Classes:
G03F7/20
Foreign References:
| US20040022068A1 | 2004-02-05 | |||
| EP1469352A2 | 2004-10-20 | |||
| US20040257559A1 | 2004-12-23 | |||
| US5863712A | 1999-01-26 |
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